Weak-field Hall resistance and effective carrier density measurements across the metal-insulator transition in Si-MOS structures

The weak-field Hall voltage in Si-MOS structures with different mobility is studied on both sides of the metal-insulator transition. In the vicinity of the critical density on the metallic side of the transition, the Hall voltage is found to deviate by 6–20 % from its classical value. The deviation does not correlate with the strong temperature dependence of the diagonal resistivity ρxx(T). In particular, the smallest deviation in Rxy is found in the highest-mobility sample, which exhibits the largest variation in the diagonal resistivity ρxx with temperature.