Designing potentials by sculpturing wires

Magnetic trapping potentials for atoms on atom chips are determined by the current flow in the chip wires. By modifying the shape of the conductor we can realize specialized current flow patterns and therefore microdesign the trapping potentials. We have demonstrated this by nano-machining an atom chip using the focused ion beam technique. We built a trap, a barrier, and using a Bose-Einstein Condensate as a probe we showed that by polishing the conductor edge the potential roughness on the selected wire can be reduced. Furthermore, we give different other designs and discuss the creation of a one-dimensional magnetic lattice on an atom chip.