Epitaxial aluminum layer on antimonide heterostructures for exploring Josephson junction effects
/ Authors
W. Pan, K. Sapkota, P. Lu, A. J. Muhowski, W. M. Martinez, C. Sovinec, R. Reyna, J. Mendez, D. Mamaluy, S. D. Hawkins
and 6 more authors
J. Klem, Layla S Smith, D. Temple, Z. Enderson, Z. Jiang, E. Rossi
/ Abstract
In this article, we present results of our recent work of epitaxially-grown aluminum (epi-Al) on antimonide heterostructures, where the epi-Al thin film is grown at either room temperature or below zero $^o$C. A sharp superconducting transition at $T \sim 1.3$ K is observed in these epi-Al films. We further show that supercurrent states are realized in Josephson junctions fabricated in the epi-Al/antimonide heterostructures with mobility $\mu \sim 1.0 \times 10^6$ cm$^2$/Vs. These results clearly demonstrate we have achieved growing high-quality epi-Al/antimonide heterostructures, a promising platform for the exploration of Josephson junction effects for quantum information science and microelectronics applications.
Journal: Materials Science and Engineering: B