A foundation model for atomistic materials chemistry.
and 58 more authors
Arghya Bhowmik, Samuel M. Blau, Vlad Cuarare, James P Darby, Sandip De, Flaviano Della Pia, Volker L. Deringer, Rokas Elijovsius, Zakariya El-Machachi, Edvin Fako, Andrea C. Ferrari, A. Genreith‐Schriever, Janine George, Rhys E. A. Goodall, Clare P. Grey, Shuang Han, Will Handley, H. H. Heenen, K. Hermansson, Christian Holm, Jad Jaafar, Stephan Hofmann, Konstantin S. Jakob, H. Jung, V. Kapil, Aaron D. Kaplan, Nima Karimitari, Namu Kroupa, J. Kullgren, Matthew C Kuner, Domantas Kuryla, Guoda Liepuoniute, Johannes T. Margraf, Ioan B Magduau, A. Michaelides, J. Moore, A. Naik, Samuel P Niblett, Sam Walton Norwood, N. O'Neill, Christoph Ortner, Kristin A. Persson, K. Reuter, Andrew S. Rosen, L. Schaaf, Christoph Schran, E. Sivonxay, T. Stenczel, V. Svahn, Christopher Sutton, C. V. D. Oord, E. Varga-Umbrich, T. Vegge, Martin Vondr'ak, Yangshuai Wang, William C Witt, F. Zills, G'abor Cs'anyi
Journal: The Journal of chemical physics
DOI: 10.1063/5.0297006