Patterned silicon substrates: A common platform for room temperature GaN and ZnO polariton lasers
/ Authors
J. Zúñiga-Pérez, E. Mallet, R. Hahe, M. J. Rashid, S. Bouchoule, C. Brimont, P. Disseix, J. Duboz, G. Gomm'e, T. Guillet
and 7 more authors
O. Jamadi, X. Lafosse, M. Leroux, J. Leymarie, Feng Li, F. R'everet, F. Semond
/ Abstract
A platform for fabricating polariton lasers operating at room temperature is introduced: nitride-based distributed Bragg reflectors epitaxially grown on patterned silicon substrates. The patterning allows for an enhanced strain relaxation, thereby enabling to stack a large number of crack-free AlN/AlGaN pairs and achieve cavity quality factors of several thousands with a large spatial homogeneity. GaN and ZnO active regions are epitaxially grown thereon, and the cavities are completed with top dielectric Bragg reflectors. The two structures display strong-coupling and polariton lasing at room temperature and constitute an intermediate step in the way towards integrated polariton devices.
Journal: Applied Physics Letters
DOI: 10.1063/1.4884120