Two-dimensional ion trap lattice on a microchip for quantum simulation

Microfabricated ion traps are a major advancement towards scalable quantum computing with trapped ions. The development of more flexible ion trap designs, in which tailored arrays of ions are positioned in two dimensions above a microfabricated surface, would lead to applications in fields as varied as quantum simulation, metrology and atom-ion interactions. Current surface ion traps often have low trap depths and high heating rates, due to the size of the voltages that can be applied to them, limiting the fidelity of quantum gates. In this article we report on a fabrication process that allows for the application of very high voltages to microfabricated devices in general and we apply this advance to fabricate a 2D ion trap lattice on a microchip. Our scalable microfabricated architecture allows for reliable trapping of 2D ion lattices, long ion lifetimes due to the deep trapping potential, rudimentary shuttling between lattice sites and the ability to deterministically introduce defects into the ion lattice.